Molecular Layer Etching Can Help Semiconductors scaling Beyond Moore's Law | NextBigFuture.com

Argonne National Labs have developed a new technique, molecular layer etching, that may help develop microelectronics and show the way beyond Moore’s Law. Molecular layer etching could enable fabricating and controlling material geometries at the nanoscale, which could open new doors in microelectronics and extend beyond traditional Moore’s Law scaling. Chemistry Matters- Molecular Layer Etching of Metalcone Films Using Lithium Organic Salts and Trimethylaluminum Together with molecular layer deposition (MLD), a deposition technique, MLE can be used to design microscopic architectures. These approaches are analogs of atomic layer deposition (ALD) and atomic layer etching (ALE), the more commonly applied techniques